Multi-beam e-beam lithography is an advanced form of e-beam, maskless or direct-write lithography. Instead of a single-beam e-beam, multi-beam e-beam makes use of multiple beams within a single tool.

After years of R&D and promises, multi-beam electron-beam technology is delayed and late to the market. The technology requires more funding and work than previously thought. And generally, the ...

(Nanowerk Spotlight) The foundation of nanotechnology research on graphene and other materials is the fact that, thanks to recent technological advances, scientists now have tools to observe materials ...

Directing acoustic waves along curved paths is critical for applications such as ultrasound imaging, surgery and acoustic cloaking. Metamaterials can direct waves by spatially varying the material ...