The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...

Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

Many applications use a manufacturing process known as thin-film sputtering deposition. The typical sputtering process uses an ion beam to impact the surface of a sputter material such as gold, silver ...

A method at the core of today’s semiconductor and optical device production, sputtering is used to put down extremely thin films of a material onto a surface, typically referred to as a substrate.

UK-based sputtering technology firm Plasma Quest has a prototype system that could dramatically increase sputtering deposition rates and cut down-time. Sputtering is used to deposit a wide variety of ...

The MEGA coating system (multi-source magnetron sputtering system) enables the production of new types of metallic or ceramic coatings in monolithic, graded or multi-layer arrangements using 7 ...

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ULVAC is shipping PZT piezoelectric thin-film sputtering equipment which advances the development of MEMS devices. It used to be impossible to fabricate PZT piezoelectric thin films, which constitute ...

Researchers at University of Tsukuba have developed a technology for real-time estimation of the valence state and growth rate of iron oxide thin films during their formation. This novel technology ...